Genesys-2

Electron Beam Lithography System

The Nanogrande Difference

Precision Nanoscale Fabrication

The Genesys-2 combines Nanogrande's breakthrough Fluid Bed® and state-of-the-art E-Beam Lithography technologies.

It delivers unmatched precision down to sub-10 nm resolution, dramatically reducing material waste and operational costs.

Designed specifically for advanced electronics manufacturing, photonics, cutting-edge research labs, and production facilities. The Genesys-2 ensures maximum efficiency without compromising accuracy.

95%

Reduction in Photoresist Waste

Unlike traditional systems, Genesys-2 leverages proprietary deposition techniques, significantly reducing photoresist usage, cleaning solvents, and water waste. 

This boosts environmental sustainability and dramatically lowers overall production costs.

Other benefits include:

Conformal Deposition → Thickness Control → Reduced Cost

Genesys-2 Specs

Maximum build size wafers up to 200 mmφ, masks up to 6-inch

__________________

Spot size (beam width) ≤1.9 nm

__________________

Minimum line width <10 nm

__________________

Minimum layer thickness down to 1 nm (photoresist deposition)

__________________

Stage resolution: 0.6 nm

__________________

Accelerating voltage up to 50 kV

Compatible Materials

The Genesys-2 is compatible with diverse materials, enabling versatile and precise manufacturing across various industries. Compatible materials include resins and polymers, metals and ceramics precursors, oxides, and advanced composites. Below are just a few examples.

Use Cases

Real-World Applications

The Genesys-2 supports groundbreaking applications in electronics, photonics, and nanotechnology research, empowering businesses, labs, and production facilities to achieve unparalleled precision and innovation.

For Further Information.